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Control of Structure of WSe_x/C Nanocoatings Synthesized via Pulsed Laser Deposition

机译:通过脉冲激光沉积合成的WSe_x / C纳米涂层的结构控制

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摘要

The requirements are formulated for a new type of nanomaterials based on transition metal dichalcogenides (TMD), which are promising to create relatively cheap and effective catalysts for electrochemical hydrogen evolution reaction. The possibility of implementation of some important requirements for the structure of these materials is investigated by the example of thin-film coatings containing tungsten dise-lenide and carbon. WSe_x/C coatings are prepared via pulsed laser deposition in an inert and reactive (CH_4) gas in a standard configuration and using an antidroplet screen. In some cases, low DC voltage or pulsed high-voltage bias are applied to the substrate, initiating ion bombardment of the coatings. Factors exerting an important influence on the chemical composition, morphology, and surface topography of the coatings are established. Modes of formation of a rough coating surface with a high density of WSe_2 edges are determined, which is essential for high catalytic activity and performance of TMD-containing nanocatalysts. The carbon phase with a high concentration of sp~2 bonds is needed for effective current transport in the formed layers.
机译:这些要求是针对基于过渡金属二卤化碳(TMD)的新型纳米材料制定的,这些材料有望为电化学放氢反应创建相对便宜和有效的催化剂。通过包含二硒化钨和碳的薄膜涂层的实例,研究了对这些材料的结构实施某些重要要求的可能性。 WSe_x / C涂层是通过在标准配置中的惰性和反应性(CH_4)气体中通过脉冲激光沉积并使用防滴滤网制备的。在某些情况下,低直流电压或脉冲高压偏压会施加到基材上,从而引发涂层的离子轰击。确定了对涂层的化学组成,形态和表面形貌产生重要影响的因素。确定了具有高WSe_2边缘密度的粗糙涂层表面的形成方式,这对于高催化活性和含TMD的纳米催化剂的性能至关重要。为了在形成的层中有效地传输电流,需要具有高浓度的sp〜2键的碳相。

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