首页> 外文期刊>Image and Vision Computing >3-D chamfer distances and norms in anisotropic grids
【24h】

3-D chamfer distances and norms in anisotropic grids

机译:各向异性网格中的3-D倒角距离和范数

获取原文
获取原文并翻译 | 示例
           

摘要

Chamfer distances are widely used in image analysis and many authors have investigated the computation of optimal chamfer mask coefficients. Unfortunately, these methods are not systematized: calculations have to be conducted manually for every mask size or image anisotropy. Since image acquisition (e.g. medical imaging) can lead to discrete anisotropic grids with unpredictable anisotropy value, automated calculation of chamfer mask coefficients becomes mandatory for efficient distance map computations. This article presents an automatic construction for chamfer masks of arbitrary sizes. This allows, first, to derive analytically the relative error with respect to the Euclidean distance, in any 3-D anisotropic lattice, and second, to compute optimal chamfer coefficients. In addition, the resulting chamfer map verifies discrete norm conditions.
机译:倒角距离已广泛用于图像分析,许多作者已经研究了最佳倒角掩模系数的计算。不幸的是,这些方法尚未系统化:必须针对每种掩模尺寸或图像各向异性手动进行计算。由于图像采集(例如医学成像)可能会导致具有不可预测的各向异性值的离散各向异性网格,因此对有效的距离图计算而言,倒角掩模系数的自动计算就变得必不可少。本文介绍了一种自动构造的任意大小的倒角蒙版。首先,这允许在任何3-D各向异性晶格中解析地得出相对于欧几里得距离的相对误差,其次,可以计算出最佳的倒角系数。此外,生成的倒角图可验证离散范数条件。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号