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Low Consumption Power Application of Pulse-Doped GaAs MESFET's

机译:脉冲掺杂GaAs MESFET的低功耗应用

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The application of pulse-doped GaAs MESFET's to a power amplifier module is discussed in this paper. The epitaxial layer structure was redesigned to have a dual pulse-doped structure for power applications, achieving a sufficient gate-drain breakdown voltage with excellent linearity. The measured load-pull characteristics of the redesigned device for the minimum power consumption design was presented. This device was shown to have almost twice the power-added efficiency of a conventional ion-implanted GaAs MESFET. Two kinds of power amplifiers were designed and fabricated, achieving Pout of 28.6 dBm at IM_3 of - 40 dBc with Pdc of 8 W and Pout of 33.0 dBm at IM_3 of - 40 dBc with Pdc of 32 W, respectively.
机译:本文讨论了脉冲掺杂GaAs MESFET在功率放大器模块中的应用。外延层结构经过重新设计,具有用于电源应用的双脉冲掺杂结构,从而获得了足够的栅极-漏极击穿电压和出色的线性度。介绍了用于最小功耗设计的重新设计设备的实测负载-牵引特性。事实证明,该器件的功率附加效率几乎是传统离子注入GaAs MESFET的两倍。设计和制造了两种功率放大器,分别在8W的Pdc下在IM_3为-40 dBc时达到28.6 dBm的Pout,在32 W的Pdc下在IM_3为-40 dBc时达到33.0 dBm的功率。

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