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Characterization of Local Electronic Transport through Ultrathin Au/Highly-Dense Si Nanocolumnar Structures by Conducting-Probe Atomic Force Microscopy

机译:超薄金/高密度硅纳米柱结构通过传导探针原子力显微镜表征局部电子传输。

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摘要

We have fabricated highly-dense Si nano-columnar structures accompanied with Si nanocrystals on W-coated quartz, and characterized their local electrical transport in the thickness direction using atomic force microscopy (AFM) with a conductive cantilever. By applying DC negative bias to the bottom W electrode with respect to a grounded top electrode made of ~10-nm-thick Au on the sample surface, current images reflecting highly-localized conduction were obtained in both contact and non-contact modes. This result is attributable to electron emission due to quasi-ballistic transport through Si nanocrystals via nanocolumnar structure.
机译:我们制造了高密度的Si纳米柱状结构,并在W涂层石英上形成了Si纳米晶体,并使用带有导电悬臂的原子力显微镜(AFM)对它们在厚度方向的局部电传输进行了表征。通过在样品表面上相对于由约10 nm厚的Au制成的接地顶部电极对底部W电极施加DC负偏压,在接触和非接触模式下均获得了反映高度局部导电的电流图像。该结果归因于由于通过纳米柱状结构通过Si纳米晶体的准弹道传输而导致的电子发射。

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