コリメータスパッタリングによる結晶配向制御の基礎検討

摘要

Fundamental investigation was performed for crystalline orientation control by collimated sputtering with the purpose of obtaining inclined anisotropy media. Enhancement effect of crystalline orientation by the collimator was observed for perpendicular orientation of hep c-axis of Co-Cr alloy and Ru films. However, only small inclined angles of less than 2 degrees were obtained with inclined deposition using inclined collimators though the collimator angle was increased as large as 45 degrees. Further detailed study is required to obtain an inclined orientation film.%傾斜異方性磁気記録媒体の作製を目指して，コリメータスパッタリングによる薄膜の結晶配向制御の基礎検討を行った．Co-Cr合金膜やRu膜ではhcp軸の膜面垂直配向について，コリメータによる配向促進効果を確認できた．しかし、斜方堆積では，コリメータ軸を45度まで傾斜させても，配向軸の便きは2度以下の僅かな値しか得られなかった．斜め配向膜の作製にはスパッタ堆積機構についての詳細な検討が必要である．