机译:Yb超薄层对并五苯MOS二极管n型特性的影响
Dept. of Electronics and Applied Physics, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, J2-72,4259 Nagatsuta, Midori-ku, Yokohama, 226-8502, Japan;
Dept. of Electronics and Applied Physics, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, J2-72,4259 Nagatsuta, Midori-ku, Yokohama, 226-8502, Japan,Dept. of Physics, Division of Quantum Phases and Device, Konkuk University, Seoul 143-701, Korea;
Dept. of Electronics and Applied Physics, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, J2-72,4259 Nagatsuta, Midori-ku, Yokohama, 226-8502, Japan;
pentacene; n-type; MOS diode; thin yb layer;
机译:超薄Yb层对并五苯MOS二极管n型特性的影响
机译:具有超薄金属界面层的n型并五苯MOS二极管的研究
机译:具有超薄金属界面层的n型并五苯MOS二极管的研究
机译:基于五烯的MOS二极管和晶体管的电气特性研究
机译:联系工程和可调谐N型掺杂超薄钼二硫化物
机译:半导体:基于并五苯/ P13 /并五苯作为电荷传输层和陷阱层的有机半导体异质结构的高性能非易失性有机场效应晶体管存储器(Adv。Sci。8/2017)
机译:基于有机半导体异质结构的高性能非易失性有机场效应晶体管存储器作为电荷输送和捕获层的五苯甲酸/ P13 /五苯二烯异质结构