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Investigation of Abnormal Drain Current Increase of Tunneling Field-Effect Transistors

机译:隧道效应晶体管异常漏极电流增加的研究

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A tunneling field-effect transistor (TFET) is a promising candidate to replace a MOSFET because the subthreshold swing (SS) of the TFET can be reduced below the 60 mV/dec at room temperature. However, the slope of log(I_(DS))-V_(GS) curve of the TFET becomes smaller as gate voltage (V_(GS)) increases and eventually becomes smaller than that of the MOSFET when V_(GS) is high. It is problematic in that the drain current (I_(DS)) of the TFET cannot exceed that of the MOSFET. In this paper, we investigated the physical origin of the abnormal drain current increase in terms of band-to-band tunneling and drift mechanism.
机译:隧道场效应晶体管(TFET)是替代MOSFET的有希望的候选者,因为在室温下TFET的亚阈值摆幅(SS)可以降低到60 mV / dec以下。但是,随着栅极电压(V_(GS))的增加,TFET的log(I_(DS))-V_(GS)曲线的斜率变得更小,最终在V_(GS)高时变得比MOSFET的小。问题在于,TFET的漏极电流(I_(DS))不能超过MOSFET的漏极电流。在本文中,我们从带间隧穿和漂移机制的角度研究了异常漏极电流增加的物理原因。

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