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Transfer Processes for Thermally Stable Large-Size TFT Flexible Substrates

机译:热稳定的大尺寸TFT柔性基板的转移工艺

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We report on glass etching transfer processes to obtain thermally stable large-size TFT flexible substrates on plastic film bases. The transfer processes include high-pressure jet etching that allows us to achieve good etch-rate uniformity over the large area and the utilization of an adhesive having a low elastic modulus. From the experiments and simulations, we find that using an adhesive having a low elastic modulus is effective in reducing bend of the flexible substrate under thermal stresses. The simulations also predict that the reduction in the bend corresponds to the reduction in the principal stress of the adhesive, leading to the suppression of the film peeling off from the thinned glass. Using the transfer processes, we have successfully fabricated thermally stable TFT flexible substrates (300 mmtimes350 mm times200 mum) that have satisfactory electrical characteristics
机译:我们报告了玻璃蚀刻转移工艺,以在塑料薄膜基底上获得热稳定的大尺寸TFT柔性基板。转移过程包括高压喷射蚀刻,这使我们能够在大面积上实现良好的蚀刻速率均匀性,并利用具有低弹性模量的粘合剂。从实验和模拟中,我们发现使用具有低弹性模量的粘合剂可有效地减小在热应力下的柔性基板的弯曲。该模拟还预测弯曲的减少对应于粘合剂的主应力的减少,从而抑制了薄膜从变薄的玻璃上剥离。通过转移工艺,我们成功地制造了具有令人满意的电气特性的热稳定的TFT柔性基板(300毫米x 350毫米x 200毫米)。

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