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首页> 外文期刊>Nuclear Science, IEEE Transactions on >Direct Comparison of Charge Collection in SOI Devices From Single-Photon and Two-Photon Laser Testing Techniques
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Direct Comparison of Charge Collection in SOI Devices From Single-Photon and Two-Photon Laser Testing Techniques

机译:通过单光子和双光子激光测试技术直接比较SOI器件中的电荷收集

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摘要

The amounts of charge collection by single-photon absorption (SPA) and by two-photon absorption (TPA) laser testing techniques have been directly compared using specially made SOI diodes. For SPA measurements and some TPA measurements, the back substrates of the diodes were removed by etching with XeF$_2$. With the back substrates removed, the amount of TPA induced charge collection can be correlated to the amount of SPA induced charge collection. There are significant differences, however, in the amount of TPA induced charge collection for diodes with and without substrates. For the SOI diodes of this study, this difference appears to arise from several contributions, including nonlinear-optical losses and distortions that occur as the pulse propagates through the substrate, as well as displacement currents that occur only when the back substrate is present. These results illustrate the complexity of interpreting TPA and SPA single-event upset measurements.
机译:使用特制的SOI二极管直接比较了通过单光子吸收(SPA)和通过双光子吸收(TPA)激光测试技术收集的电荷量。对于SPA测量和一些TPA测量,通过使用XeF $ _ 2 $ 蚀刻来去除二极管的后基板。在移除后基板的情况下,TPA诱导的电荷收集量可以与SPA诱导的电荷收集量相关。但是,在有和没有基板的情况下,TPA诱导的电荷收集量存在显着差异。对于本研究的SOI二极管,这种差异似乎是由多种因素引起的,包括非线性光学损耗和随着脉冲传播穿过基板而发生的畸变,以及仅在存在背面基板时才发生的位移电流。这些结果说明了解释TPA和SPA单事件翻转测量的复杂性。

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