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Damage Separation in a Bipolar Junction Transistor Following Irradiation With 250-MeV Protons

机译:250 MeV质子辐照后的双极结型晶体管中的损伤分离

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摘要

Irradiation of 2N5339 n-p-n bipolar junction transistors (BJTs) with either 250-MeV protons or 10-keV X-rays shifts the input characteristics to lower values of V-BE while degrading the current gain and drive current. The degradation is consistent with increased recombination in the neutral base and emitter-base (E-B) depletion region. A decrease in collector current following proton irradiation suggests that recombination in the neutral base is significant. At a given ionizing dose, degradation is worse for proton irradiation than for X-ray irradiation due to the presence of displacement damage and a higher charge yield. A comparison of degradation produced by the two radiation sources suggests that similar to 40% of the excess base current resulting from 250-MeV proton irradiation is due to ionization damage. When compared with previous results for other devices, these results suggest that ionization-to-displacement damage ratios in bipolar devices may increase with proton energy in a way that is consistent with trends in charge yield and non-ionizing energy loss (NIEL).
机译:用250MeV质子或10keV X射线照射2N5339 n-p-n双极结型晶体管(BJT),会在降低电流增益和驱动电流的同时将输入特性转移到较低的V-BE值。降解与中性基极和发射极-基极(E-B)耗尽区中复合的增加相一致。质子辐照后集电极电流的降低表明中性碱中的重组很重要。在给定的电离剂量下,质子辐射的降解比X射线辐射的降解更严重,这是因为存在位移损伤和较高的电荷产率。两种辐射源产生的降解的比较表明,由250 MeV质子辐照产生的过量基础电流的40%类似于电离损伤。当与其他设备的先前结果进行比较时,这些结果表明,双极型设备中的电离位移损伤比可能随质子能量的增加而增加,其方式与电荷产量和非电离能量损失(NIEL)的趋势一致。

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