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A SPICE-Compatible Model of MOS-Type Graphene Nano-Ribbon Field-Effect Transistors Enabling Gate- and Circuit-Level Delay and Power Analysis Under Process Variation

机译:MOS型石墨烯纳米带场效应晶体管的SPICE兼容模型,可在过程变化下实现门级和电路级延迟以及功率分析

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This paper presents the parameterized SPICE-compatible compact model of a graphene nano-ribbon field-effect transistor (GNRFET) with doped reservoirs, also known as MOS-type GNRFET. The current and charge models closely match numerical TCAD simulations. In addition, process variation in transistor dimension, line edge roughness, and doping level in the reservoirs are accurately modeled. Our model provides a means to analyze delay and power of graphene-based circuits under process variation, and offers design and fabrication insights for graphene circuits in the future. We show that line edge roughness severely degrades the advantages of GNRFET circuits; however, GNRFET is still a good candidate for low-power applications.
机译:本文介绍了带有掺杂储层的石墨烯纳米带场效应晶体管(GNRFET)的参数化SPICE兼容紧凑模型,也称为MOS型GNRFET。电流和电荷模型与TCAD数值模拟非常匹配。此外,晶体管的尺寸,线边缘粗糙度和储层中的掺杂水平的工艺变化都可以精确建模。我们的模型提供了一种分析工艺变化下基于石墨烯的电路的延迟和功耗的方法,并为将来的石墨烯电路提供了设计和制造方面的见识。我们表明,线边缘粗糙度严重降低了GNRFET电路的优势;但是,GNRFET仍然是低功耗应用的理想选择。

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