首页> 外文期刊>IEEE Transactions on Microwave Theory and Techniques >Characterization and modeling of bias dependent breakdown and self-heating in GaInP/GaAs power HBT to improve high power amplifier design
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Characterization and modeling of bias dependent breakdown and self-heating in GaInP/GaAs power HBT to improve high power amplifier design

机译:GaInP / GaAs功率HBT中与偏置相关的击穿和自热的特性和建模,以改善大功率放大器的设计

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摘要

It is usual to say that power GaInP/GaAs heterojunction bipolar transistors (HBTs) have many advantages for power amplification at microwave frequencies, because of their high gain and high power density. Furthermore, the possibility of controling the base biasing conditions (voltage, current, self-bias control) compared to a field-effect transistor offers additive degrees of freedom to make a tradeoff between linearity and power-added efficiency. Nevertheless existing devices are limited because of the relatively low breakdown voltage whereas high collector voltage swings are required to achieve high power. This drawback makes them not appropriate for use in the next generation of mobile communication base station or radar systems. Silicon technologies such as LDMOS and III-V devices (MESFET and HFET) present competitive performances in term of high power level but for medium power added efficiency. Important improvements have been made in recent years which make possible large breakdown voltages for GaInP/GaAs HBTs. Breakdown value close to 67 V has been achieved. The aim of this work is to significantly improve the modeling of the breakdown voltage on this type of transistor. Furthermore, the in depth characterization and modeling of self-heating effects have been greatly improved in order to improve thermal management solutions which enable us to enhanced design solutions of HBT high power amplifiers.
机译:通常说来,功率GaInP / GaAs异质结双极晶体管(HBT)具有微波增益的许多优点,因为它们具有高增益和高功率密度。此外,与场效应晶体管相比,控制基本偏置条件(电压,电流,自偏置控制)的可能性提供了附加的自由度,可以在线性度和功率附加效率之间进行权衡。然而,由于击穿电压相对较低而限制了现有设备,而需要高集电极电压摆幅才能实现高功率。这个缺点使它们不适用于下一代移动通信基站或雷达系统。诸如LDMOS和III-V器件(MESFET和HFET)之类的硅技术在高功率水平方面表现出竞争优势,但在中等功率附加效率方面却表现出竞争力。近年来,已经进行了重要的改进,使得GaInP / GaAs HBT的击穿电压更高。击穿值已接近67V。这项工作的目的是显着改善这种晶体管的击穿电压模型。此外,自热效应的深度表征和建模已得到极大改进,以改进热管理解决方案,从而使我们能够增强HBT大功率放大器的设计解决方案。

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