Millimeter-Wave Substrate Integrated Waveguides and Filters in Photoimageable Thick-Film Technology

摘要

This paper presents the design and fabrication of substrate-integrated waveguides and filters for use at millimeter-wave frequencies. The components described are fabricated using photoimageable thick-film materials. Measurements on V- and W-band waveguide-to-microstrip transitions are presented. Losses resulting from the reduced-height nature of the waveguides are extracted from thru-relect-line calibration standards illustrating the effect of current losses in the broadwalls of the waveguides. The design of fourth-order 0.01-dB ripple Chebyshev resonant cavity filters operating at V-, W-, D-, and G-band is presented. The measured results of all components are in excellent agreement with simulated predictions.