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首页> 外文期刊>IEEE Transactions on Microwave Theory and Techniques >Optimization and Realization of Planar Isolated GaAs Zero-Biased Planar Doped Barrier Diodes for Microwave/Millimeter-Wave Power Detectors/Sensors
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Optimization and Realization of Planar Isolated GaAs Zero-Biased Planar Doped Barrier Diodes for Microwave/Millimeter-Wave Power Detectors/Sensors

机译:微波/毫米波功率检测器/传感器的平面隔离GaAs零偏置平面掺杂掺杂二极管的优化与实现

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摘要

A high tangential signal sensitivity (TSS) zero-bias GaAs planar doped barrier (PDB) diode for microwave and millimeter-wave power detection applications is presented. The fabricated PDB diodes have shown 4 dB better TSS at 35 GHz than that of reported devices, considerably increasing the minimum detectable power and widening the dynamic range. The high TSS was obtained by optimizing the PDB layer structures, namely, the delta-doped p++ layer and the two intrinsic layers, and by employing ion bombardment to better define the device and reduce parasitic effects. The isolation properties of ion bombarded epitaxial layers on GaAs substrates were examined and optimized to have a sheet resistivity of 108 Omega/sq. The temperature dependence of the barrier height of the PDB diode has been investigated experimentally, showing positive temperature coefficient and, hence, better thermal stability. We have also defined the critical barrier height and derived its analytical expression, which gives the theoretically lowest possible barrier height of a PDB diode
机译:提出了一种用于微波和毫米波功率检测应用的高切向信号灵敏度(TSS)零偏置GaAs平面掺杂势垒(PDB)二极管。所制造的PDB二极管在35 GHz频率下的TSS比报道的器件高4 dB,从而大大提高了最小可检测功率并扩大了动态范围。通过优化PDB层结构(即掺杂三角形的p ++层和两个本征层),并通过离子轰击来更好地定义器件并减少寄生效应,可以获得较高的TSS。检查并优化了GaAs衬底上离子轰击外延层的隔离特性,使其薄层电阻率为108 Omega / sq。已对PDB二极管的势垒高度的温度依赖性进行了实验研究,显示出正温度系数,因此具有更好的热稳定性。我们还定义了临界势垒高度并推导了其解析表达式,这给出了PDB二极管的理论上最低的势垒高度

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