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Vertical High-$Q$ RF-MEMS Devices for Reactive Lumped-Element Circuits

机译:垂直高价Q $ RF-MEMS器件,用于无功块状电路

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摘要

Compact reactive lumped-element circuits fabricated using a single thick metal-layer deep X-ray lithography process are presented. Vertically oriented capacitive features are combined with inductive features in $> $0.25-mm-thick metal layers to realize lumped-element filter and coupler microstructures operating at up to 12 GHz. Measurements for separate thick metal reactive structures are also presented, including variable capacitors and single-turn square loop inductors. Devices feature impressive vertical structure, including a 77:1 aspect ratio, 1.3-$mu$m-wide cantilever gap structure in 100-$mu$ m-thick photoresist. A 0.6-pF capacitor has $Q$-factors of 95 at 5.6 GHz and 214 at 3.5 GHz, and a structurally compatible 1.2-nH loop inductor has a $Q$-factor of 47 at 6.8 GHz and a self-resonant frequency of 18.8 GHz. Together, these types of devices could form the building blocks for various integrated reactive lumped-element-based circuits.
机译:提出了使用单层厚金属层深X射线光刻工艺制造的紧凑型无源集总元件电路。垂直定向的电容特性与$> $ 0.25 mm厚金属层中的电感特性相结合,以实现集总元件滤波器和耦合器微结构,其工作频率高达12 GHz。还介绍了对单独的厚金属电抗性结构的测量,包括可变电容器和单匝方形环路电感器。器件具有令人印象深刻的垂直结构,包括77:1的纵横比,在100-μm厚的光刻胶中的1.3-μm宽的悬臂间隙结构。一个0.6 pF电容器在5.6 GHz时的QQ因子为95,在3.5 GHz时为214,结构兼容的1.2nH环路电感在6.8 GHz时的QQ因数为47,自谐振频率为18.8 GHz。这些类型的设备一起可以构成各种集成的基于电抗集总元件的电路的基础。

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