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首页> 外文期刊>IEEE Transactions on Magnetics >Finite-Element Analysis of Stress Induced Magnetic Anisotropy in Perpendicular Writers
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Finite-Element Analysis of Stress Induced Magnetic Anisotropy in Perpendicular Writers

机译:垂直作家中应力感应磁各向异性的有限元分析

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This paper presents finite-element analysis of the stress-induced magnetic anisotropy in perpendicular magnetic recording (PMR) heads developed during fabrication. The intrinsic stresses of various thin films used in the heads were measured using wafer curvature, while the stress in the yoke region was measured using X-ray diffraction. The measured stresses are provided. The initial strains due to the intrinsic stresses in the films were modeled using equivalent thermal strains and the calculations were verified by correlations with the stress measurements. Finite-element simulations were performed for calculating the stresses in full PMR heads. Detailed simulation procedures are described. Computed results are presented on how sensitive the magnetic anisotropy in the write pole are to the pole tip length and the slider lapping and the compressive stress in overcoat as well as the ambient temperature
机译:本文介绍了在制造过程中开发的垂直磁记录(PMR)磁头中应力感应的磁各向异性的有限元分析。使用晶片曲率测量在磁头中使用的各种薄膜的固有应力,而使用X射线衍射测量磁轭区域中的应力。提供了测得的应力。使用等效热应变对膜中固有应力引起的初始应变进行建模,并通过与应力测量值的相关性验证了计算结果。进行了有限元模拟,以计算完整PMR磁头中的应力。描述了详细的仿真过程。计算结果显示了写磁极中的磁各向异性对磁极尖端长度和滑块研磨的敏感性以及保护层中的压缩应力以及环境温度的敏感性

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