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Influence of Pulse Reverse Plating on the Properties of Ni-Fe Thin Films

机译:脉冲反镀对Ni-Fe薄膜性能的影响

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NiFe thin films deposited by pulse reverse (PR) electrodeposition are promising candidates for the next generation of core magnetic material to be used in magnetic components operating at high switching frequency. The influence of PR electroplating on the structural, magnetic and electrical properties of NiFe is assessed by means of a design of experiment (DOE). Results are compared to NiFe alloys produced by direct current (dc) deposition from an identical electrolyte. The PR samples exhibit an increase in resistivity and relative permeability by a factor of 2 and 1.5, respectively, in comparison to the dc samples. The coercivity and saturation flux density of the PR samples are reduced by 37% and 5%, respectively.
机译:通过脉冲反向(PR)电沉积沉积的NiFe薄膜有望成为下一代核心磁性材料的候选材料,这些材料将用于以高开关频率工作的磁性部件中。通过实验设计(DOE)评估了PR电镀对NiFe的结构,磁和电性能的影响。将结果与由相同电解质通过直流(dc)沉积产生的NiFe合金进行比较。与直流样品相比,PR样品的电阻率和相对磁导率分别增加了2倍和1.5倍。 PR样品的矫顽力和饱和磁通密度分别降低了37%和5%。

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