首页> 外文期刊>IEEE Transactions on Magnetics >In-situ deposition and processing of YBa/sub 2/Cu/sub 3/O/sub 7-x/ films and multilayers for optoelectronic devices
【24h】

In-situ deposition and processing of YBa/sub 2/Cu/sub 3/O/sub 7-x/ films and multilayers for optoelectronic devices

机译:YBa / sub 2 / Cu / sub 3 / O / sub 7-x /薄膜和光电器件多层膜的原位沉积和处理

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

In situ direct deposition at approximately 700 degrees C of thin YBa/sub 2/Cu/sub 3/O/sub 7-x/ superconductive films and multilayers has been done by three techniques using stoichiometric YBa/sub 2/Cu/sub 3/O/sub 7-x/ sintered targets. Excimer laser ablation in a DC magnetron system with hollow and planar targets leads to 0.5-, 1.2-, and 2.5-in diameter uniformly superconductive layers under static conditions. High critical current densities (<10/sup 6/ A cm/sup 2/ at 77 K) associated with low resistivity and good epitaxial behavior are achieved on top of MgO, SrTiO/sub 3/, LaAlO/sub 3/, and YSZ single-crystal wafers. High-quality c-oriented films (T/sub c/<80 K) are routinely obtained by means of a DC magnetron on large sapphire (<2 in) substrates covered by a YSZ RF sputtered buffer layer. The infrared properties of such films have been checked at 1.15- mu m wavelength. In order to achieve active devices (such as optical detectors and high-frequency mixers), small (>10- mu m/sup 2/) YBa/sub 2/Cu/sub 3/O/sub 7/-YSZ-Ag tunnel junctions and arrays have been successfully patterned in the superconductor/insulatorormal-metal trilayers using SNOP (selective niobium overlap process).
机译:薄YBa​​ / sub 2 / Cu / sub 3 / O / sub 7-x /超导薄膜和多层膜在大约700摄氏度的条件下直接沉积,采用化学计量的YBa / sub 2 / Cu / sub 3 / O / sub 7-x /烧结靶。具有空心和平面靶材的DC磁控管系统中的准分子激光烧蚀在静态条件下会产生直径分别为0.5、1.2和2.5的均匀超导层。在MgO,SrTiO / sub 3 /,LaAlO / sub 3 /和YSZ的顶部实现了与低电阻率和良好外延行为相关的高临界电流密度(<10 / sup 6 / A cm / sup 2 /在77 K时)单晶硅片。通常是通过直流磁控管在被YSZ RF溅射缓冲层覆盖的大型蓝宝石(<2英寸)基板上获得高质量的c取向薄膜(T / sub c / <80 K)。已经在1.15μm的波长处检查了这种膜的红外特性。为了实现有源设备(例如光学探测器和高频混频器),请使用较小的(>10-μm/ sup 2 /)YBa / sub 2 / Cu / sub 3 / O / sub 7 / -YSZ-Ag隧道结和阵列已使用SNOP(选择性铌重叠工艺)成功地在超导体/绝缘体/普通金属三层中形成了图案。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号