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Thermal stability of spin dependent tunneling junctions pinned with IrMn

机译:IrMn固定的自旋相关隧穿结的热稳定性

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Spin dependent tunneling junctions have been fabricated by rf sputtering and photolithography patterning. The junctions have adequate thermal stability to withstand the high temperatures encountered in backend microelectronics integration processing with on-chip IC (from 275 to 300/spl deg/C for one hour) and standard component packaging (200/spl deg/C for six hours). These materials also have the potential for long term device operation at high temperatures of at least 150/spl deg/C-there is little change in the properties upon additional annealing at 150/spl deg/C for 510 hours, after being pre-annealed at 275/spl deg/C for two hours. With excellent intrinsic physical properties such as a high JMR ratio of <20%, a low coercivity of >10 Oe, a high resistance, a wide bandwidth, and room temperature operation, SDT materials are superior to other technologies for low field, low power, and low cost applications. With the ability of microelectronics fabrication processing and the compatibility of backend integrating process with IC on-chip, this new technology holds great potential for commercialization in magnetic field sensing devices.
机译:自旋相关的隧道结已经通过射频溅射和光刻图案化制造。这些结具有足够的热稳定性,可以承受使用片上IC进行后端微电子集成处理时遇到的高温(从275至300 / spl deg / C持续一小时)和标准组件封装(200 / spl deg / C持续六小时)。 )。这些材料还具有在至少150 / spl deg / C的高温下长期运行的潜力-预退火后,在150 / spl deg / C的温度下进行额外退火510小时后,性能几乎没有变化在275 / spl摄氏度/摄氏度下加热两个小时。 SDT材料具有出色的固有物理特性,例如<20%的高JMR比,> 10 Oe的低矫顽力,高电阻,宽带宽以及室温下运行,因此在低磁场,低功耗方面优于其他技术,以及低成本的应用程序。凭借微电子制造工艺的能力以及后端集成工艺与片上IC的兼容性,这项新技术在磁场传感设备中具有巨大的商业化潜力。

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