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首页> 外文期刊>IEEE Transactions on Magnetics >Effects of initial layer surface roughness on GMR performance of Si/Cu/NiFe/Cu/Co/Cu/NiFe dual spin-valves for MRAM
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Effects of initial layer surface roughness on GMR performance of Si/Cu/NiFe/Cu/Co/Cu/NiFe dual spin-valves for MRAM

机译:初始层表面粗糙度对用于MRAM的Si / Cu / NiFe / Cu / Co / Cu / NiFe双自旋阀GMR性能的影响

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摘要

The effects of initial layer surface roughness on GMR performance for magnetoresistance random access memory (MRAM) have been investigated as a function of Cu buffer layer thickness and input sputtering power of Si/Cu/NiFe/Cu/Co/Cu/NiFe dual spin valves. The GMR ratio increased up to 4.5% as Cu buffer layer thickness decreased from 30 nm to 5 nm and input sputtering power increased from 50 to 300 W. According to ex-situ atomic force microscopy and Auger electron spectroscopy analyzes, the higher GMR ratio is mainly due to smoother interfacial roughness of the multilayers and smaller oxygen content inside the GMR stacks. It is revealed that the initial layer surface roughness is dependent upon the deposition parameters and film thickness plays a key role in determining the surface roughness and magnetic coupling of subsequent magnetic multilayers.
机译:研究了初始层表面粗糙度对磁阻随机存取存储器(MRAM)的GMR性能的影响,该影响是Cu缓冲层厚度和Si / Cu / NiFe / Cu / Co / Cu / NiFe双自旋阀输入溅射功率的函数。当Cu缓冲层厚度从30 nm减小到5 nm,并且输入溅射功率从50 W增大到300 W时,GMR比增加了4.5%。根据异位原子力显微镜和俄歇电子能谱分析,GMR比越高主要是由于多层的界面粗糙度更平滑,以及GMR堆内部的氧含量较低。揭示了初始层的表面粗糙度取决于沉积参数,并且膜厚度在确定随后的磁性多层的表面粗糙度和磁耦合中起关键作用。

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