2Ga films were grown on MgO substrates with different thicknesses of Cr buffer layer using '/> Tunable Phase of Mn<sub>2</sub>Ga Films on Cr Buffer Layer
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Tunable Phase of Mn2Ga Films on Cr Buffer Layer

机译:Cr缓冲层上Mn 2 Ga膜的可调谐相

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摘要

Thin Mn2Ga films were grown on MgO substrates with different thicknesses of Cr buffer layer using the molecular beam epitaxy technique. The cubic half-Heusler C1b structure is obtained when the thickness of Cr buffer layer is below 3 nm. The phase is proven to show soft ferrimagnetism with a saturation magnetization Ms of 280 emu/cc. Tetragonal hard ferrimagnetic Mn2Ga in D022structure with high-perpendicular magnetic anisotropy is obtained when increasing the thickness of Cr buffer above 3 nm. Different phases of Mn2Ga films with various thicknesses of Cr buffer can be attributed to the tensile strain and the Cr-Mn2Ga interface condition.
机译:细Mn n 2 nGa薄膜。当Cr缓冲层的厚度小于3nm时,获得立方半霍斯勒C1b结构。事实证明该相显示出软亚铁磁性,饱和磁化强度Ms为280 emu / cc。四方硬铁磁性Mn n 2 nGa in D0 n 22 n结构。 Mn n 2 nGa膜具有不同厚度的Cr缓冲膜可以归因于拉伸应变和Cr-Mn n 2 nGa接口条件。

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