首页> 外文期刊>IEEE Transactions on Magnetics >Effect of Annealing on Extraordinary Hall Effects in Sputtered Granular Cu$_80$Co$_20$Thin Films
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Effect of Annealing on Extraordinary Hall Effects in Sputtered Granular Cu$_80$Co$_20$Thin Films

机译:退火对溅射Cu__80 $ Co $ _20 $薄膜薄膜异常霍尔效应的影响

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摘要

This work explores the nanostructure dependence of extraordinary Hall effect (EHE) in Cu$_80$Co$_20$granular thin films. Upon annealing, an unusual nanostructure evolution in Cu–Co into two Co particles-size distribution affects the magnetotransport properties, most evidently in the EHE. It was concluded that the EHE in annealed films primarily depends on the population of smaller sized particles. Upon annealing, the EHE field sensitivity was gradually reduced from 0.78 n$Omega$-cm/Oe for the as-deposited film to 0.04 n$Omega$-cm/Oe for 400$^circ$C annealed one.
机译:这项工作探索了Cu $ _80 $ Co $ _20 $颗粒薄膜中非凡霍尔效应(EHE)的纳米结构依赖性。退火后,Cu-Co中异常的纳米结构演变成两个Co粒径分布会影响磁传输性能,最明显的是在EHE中。结论是,退火膜中的EHE主要取决于较小尺寸的颗粒。退火后,EHE场灵敏度从刚沉积的薄膜的0.78nΩ-cm/ Oe逐渐降低到400℃退火的0.04nΩ/ cm / Oe。

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