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机译:$ hbox {In} _ {0.52} hbox {Al} _ {0.48} hbox {As / In} _ {m} hbox {Ga} _ {1-m} hbox的微波和噪声性能表征的温度相关分析模型{As} $ $(hbox {0.53} leq m leq hbox {0.8})$ DG-HEMT
Semiconductor Device Research Laboratory, Department of Electronic Science, University of Delhi South Campus, New Delhi, India;
Indium; Logic gates; Microwave devices; Microwave oscillators; Noise; Performance evaluation; Temperature dependence; Double-gate; InAlAs/InGaAs; high-electron mobility transistor (HEMT); indium mole fraction; minimum noise figure; temperature dependence; unilateral power gain;
机译:基于原子层蚀刻的高性能两步式工艺$ hbox {In} _ {0.52} hbox {Al} _ {0.48} hbox {As} hbox {/} hbox {In} _ {0.53} hbox {Ga} _ {0.47} hbox {As} $ p-HEMT
机译:栅几何嵌入式纳米级$ hbox {In} _ {0.52} hbox {Al} _ {0.48} hbox {As} $ – $ hbox {In} _ {0.53} hbox {Ga} _ {0.47} hbox {As} $双门HEMT高故障率
机译:使用原子层蚀刻的两步式凹进工艺对$ hbox {In} _ {0.52} hbox {Al} _ {0.48} hbox {As / In} _ {0.53} hbox {Ga} _ {0.47 } hbox {As} $ p-HEMT
机译:HBOX - 连接房屋
机译:棘突类hbox12 / pmar1 / micro1多基因家族的时空表达和拷贝数变异的多样性
机译:$$( hbox {c} _ {7} hbox {h} _ {10} hbox {n})_ {4} hbox {h} _ {2 } hbox {p} _ {2} hbox {mo} _ {5} hbox {o} _ {o} _ {2} cdot hbox {h} _ {2} hbox {o} $$$(c 7 H 10 N)4 H 2 P 2 Mo 5 O 23·H 2 O