Digital processing of VLSI circuit images obtained from a scanning electron microscope

摘要

The aim of this work is to detect and correct deformations of images of VLSI circuits obtained from a scanning electron microscope (SEM) and obtain a perfect image for comparison (correlation) with the mask descriptions provided by CAD tools for automatic test of circuits. The major application area is in debugging the prototype circuits. The programs, which use the correlation between the corrected image and the mask, can be efficiently employed in the IC failure analysis phase (structural defects).