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Enhancing the Output Power of GaN-Based LEDs Grown on Wet-Etched Patterned Sapphire Substrates

机译:增强湿法刻蚀蓝宝石衬底上生长的GaN基LED的输出功率

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摘要

GaN-based light-emitting diodes (LEDs) with emitting wavelength of 450 nm were grown on patterned sapphire substrates (PSSs) fabricated by chemical wet etching. The crystallography-etched facet was {1-102} R-plane with a 57 deg against {0001} C-axis and had superior capability for enhancing light extraction efficiency. The light output power of the PSS LED was 1.15 times higher than that of the conventional LED at an injection current of 20 mA. The output power and external quantum efficiency were estimated to be 9 mW and 16.4percent, respectively. The improvement was attributed not only to geometrical shapes of {1-102} crystallography-etched facets that efficiently scatter the guided light to find escape cones, but also to dislocation density reduction by adopting the PSS growth scheme.
机译:发射波长为450 nm的GaN基发光二极管(LED)生长在通过化学湿法蚀刻制成的图案化蓝宝石衬底(PSS)上。晶体学刻蚀的小面是{1-102} R平面,相对于{0001} C轴有57度角,并且具有增强光提取效率的出色功能。在注入电流为20 mA时,PSS LED的光输出功率是传统LED的光输出功率的1.15倍。估计输出功率和外部量子效率分别为9 mW和16.4%。这种改进不仅归因于{1-102}晶体学刻蚀的刻面的几何形状,这些刻面有效地散射了导光以找到逃逸锥,还归因于采用PSS生长方案降低了位错密度。

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