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首页> 外文期刊>Photonics Technology Letters, IEEE >Design of Laterally Index-Coupled Grating III-V on Thin-SOI Distributed Feedback Lasers
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Design of Laterally Index-Coupled Grating III-V on Thin-SOI Distributed Feedback Lasers

机译:薄SOI分布反馈激光器上的横向折射率耦合光栅III-V的设计

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摘要

We present performance analysis of laterally index-coupled grating-based /4-phase shifted heterogeneous III–V/Si distributed feedback laser diode. The laterally index-coupled grating has advantage of undistorted transverse mode profile with changes in layer and grating dimensions for targeting coupling coefficient. The coupling coefficient is inversely proportional to the central gap spacing of the grating. It ranges from sub-100 to 330 cm for III–V ridge-widths from 2 to 4 , etch-depths of 120 to 240 nm. The maximum possible optical output power ranges from 2 to 6 mW, based on device thermal impedances calculated by 2-D finite-element model.
机译:我们介绍了基于横向折射率耦合光栅的/ 4相移异质III–V / Si分布式反馈激光二极管的性能分析。横向折射率耦合光栅具有不失真的横向模式轮廓的优点,其中层和光栅尺寸的变化用于瞄准耦合系数。耦合系数与光栅的中心间隙间隔成反比。 III–V脊的宽度从2到4,蚀刻深度为120到240 nm,范围从100厘米到330厘米。根据二维有限元模型计算出的器件热阻,最大可能的光输出功率范围为2至6 mW。

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