首页> 外文期刊>IEEE Photonics Technology Letters >Room Temperature 3.5- src='/images/tex/26026.gif' alt='mu text{m}'> Mid-Infrared InAs Photovoltaic Detector on a Si Substrate
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Room Temperature 3.5- src='/images/tex/26026.gif' alt='mu text{m}'> Mid-Infrared InAs Photovoltaic Detector on a Si Substrate

机译:室温3.5- src =“ / images / tex / 26026.gif” alt =“ mu text {m}”> 硅衬底上的中红外InAs光伏探测器

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摘要

We report a mid-infrared InAs p-i-n photovoltaic detector on a Si substrate operating at room temperature with a cutoff wavelength at 3.5 . The large 11.6% lattice mismatch between the device layer (InAs) and the Si substrate is accommodated by employing a compositionally graded buffer layer technique using solid-source molecular beam epitaxy and a commercially available GeSi substrate. An AlxIn1–xAs graded buffer layer is used to linearly scale the lattice constant from AlAs to InAs with an increasing value. The photovoltaic detector has a responsivity of 0.57 A/W, measured using a blackbody source maintained at 700 °C.
机译:我们报告了在室温下以3.5截止波长工作的Si基板上的中红外InAs p-i-n光伏探测器。器件层(InAs)和Si衬底之间存在11.6%的较大晶格失配,这是通过采用成分分级的缓冲层技术(使用固体源分子束外延和可商购的GeSi衬底)解决的。 AlxIn1-xAs渐变缓冲层用于以递增的值线性缩放从AlAs到InAs的晶格常数。光伏探测器的响应度为0.57 A / W,使用保持在700°C的黑体源测量。

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