...
首页> 外文期刊>IEEE Microwave and Guided Wave Letters >V-band monolithic low-noise amplifiers using ion-implanted n/sup +/-self-aligned GaAs MESFETs
【24h】

V-band monolithic low-noise amplifiers using ion-implanted n/sup +/-self-aligned GaAs MESFETs

机译:使用离子注入n / sup +/-自对准GaAs MESFET的V波段单片低噪声放大器

获取原文
获取原文并翻译 | 示例

摘要

V-band monolithic low-noise amplifiers (LNAs) were successfully fabricated using a manufacturable GaAs MESFET process. Ion-implanted n/sup +/-self-aligned GaAs MESFETs, which are used to make digital ICs, were employed. A fabricated single-stage LNA with a 0.13 /spl mu/m Au/WSiN gate demonstrated a noise figure of 5 dB at 60 GHz with an associated gain of 7 dB. A two-stage LNA achieved a noise figure of 6 dB at 60 GHz with an associated gain of 14 dB. This is the first demonstration of ion-implanted n/sup +/-self-aligned GaAs MESFETs for millimeter-wave monolithic integrated circuits (MIMICs). The results are among the best ever reported for V-band GaAs-MESFET amplifiers.
机译:使用可制造的GaAs MESFET工艺成功制造了V波段单片低噪声放大器(LNA)。使用了用于制造数字IC的离子注入n / sup +/-自对准GaAs MESFET。制作的具有0.13 / spl mu / m Au / WSiN门的单级LNA在60 GHz时的噪声系数为5 dB,相关增益为7 dB。两级LNA在60 GHz时的噪声系数为6 dB,相关增益为14 dB。这是用于毫米波单片集成电路(MIMIC)的离子注入n / sup +/-自对准GaAs MESFET的首次演示。该结果是有记录的V波段GaAs-MESFET放大器之一。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号