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Photonic crystals and microdisk cavities based on GaInAsP-InP system

机译:基于GaInAsP-InP系统的光子晶体和微腔

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This paper presents a preliminary guide to realize microcavity semiconductor lasers exhibiting spontaneous emission control effects. It includes: 1) theoretical consideration on the effects; 2) processing techniques for semiconductor microcavities; and 3) some demonstrations of photonic crystal and microdisk cavity. It was shown that, even with a spectral broadening of electron transition, thresholdless lasing operation and alternation of spontaneous emission rate are expected in a cavity satisfying the single mode condition that only one mode is allowed in the transition spectrum. An ideal three-dimensional (3-D) photonic crystal has the potentiality for realizing this condition. In two-dimensional (2-D) crystals and microdisk cavities, thresholdless operation is also expected, but the alternation of spontaneous emission rate may be negligible due to the insufficient optical confinement. In the experiment, some processing techniques for GaInAsP-InP system were investigated and methane-based reactive ion beam etching was selected because of the smooth sidewalls and adaptability to arbitrary structures. A GaInAsP-InP 2-D photonic crystal constructed by submicron columns was fabricated using this method. Owing to the slow surface recombination of this material, a polarized photoluminescence and peculiar transmission spectra were observed at room temperature (RT), which can be explained by a photonic band calculation. However, some technical improvement is necessary for clear demonstration of photonic bandgap, which is minimally required for device applications. In contrast to this, a GaInAsP-InP microdisk cavity of 2 /spl mu/m in diameter, which corresponds to the cavity volume 2.5 times the single-mode condition, has achieved RT lasing with threshold current as low as 0.2 mA. Further reduction of diameter and realization of continuous-wave (CW) operation will provide a significant regime for the observation of spontaneous emission control effects.
机译:本文提出了实现具有自发发射控制效果的微腔半导体激光器的初步指南。它包括:1)关于影响的理论考虑; 2)半导体微腔的加工技术; 3)光子晶体和微盘腔的一些演示。结果表明,即使在电子跃迁的光谱变宽的情况下,在满足单模条件(在跃迁谱中仅允许一个模态)的腔中,也有望实现无阈值的激光操作和自发发射率的交替。理想的三维(3-D)光子晶体具有实现此条件的潜力。在二维(2-D)晶体和微盘腔中,也有望实现无阈值操作,但是由于光学限制不足,自发发射率的变化可能可以忽略不计。在实验中,研究了GaInAsP-InP系统的一些处理技术,并选择了基于甲烷的反应离子束蚀刻技术,因为它具有光滑的侧壁和对任意结构的适应性。使用该方法制造了由亚微米柱构成的GaInAsP-InP 2-D光子晶体。由于该材料的缓慢表面重组,在室温(RT)下观察到偏振光致发光和特殊的透射光谱,这可以通过光子能带计算来解释。但是,为了清晰展示光子带隙,必须进行一些技术改进,而这对于设备应用来说是最低限度的要求。与此相反,直径为2 / spl mu / m的GaInAsP-InP微型磁盘腔(对应于腔体积为单模条件的2.5倍)已经实现了RT激射,其阈值电流低至0.2 mA。直径的进一步减小和连续波(CW)操作的实现将为观察自发发射控制效果提供重要的方案。

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