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首页> 外文期刊>IEEE journal of selected topics in quantum electronics >Growth of InGaN self-assembled quantum dots and their application to lasers
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Growth of InGaN self-assembled quantum dots and their application to lasers

机译:InGaN自组装量子点的生长及其在激光器中的应用

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We have successfully grown InGaN self assembled quantum dots (QD's) on a GaN layer, using atmospheric-pressure metalorganic chemical vapor deposition (MOCVD). The average diameter of the QD's was as small as 8.4 nm, and strong emission from the QD's was observed at room temperature. Next, we have investigated a structure in which InGaN QD's were stacked to increase the total QD density. InGaN QD's were formed even when the number of stacked layers was ten. As the number of layers increased, the photoluminescence (PL) intensity increased drastically. Moreover, we have fabricated a laser structure with InGaN QD's embedded into the active layer. A clear threshold of 6.0 mJ/cm/sup 2/ was observed in the dependence of the emission intensity on the excitation energy at room temperature under optical excitation. Above the threshold, the emission was strongly polarized in the transverse electric (TE) mode, and the linewidth of the emission spectra was reduced to below 0.1 nm (resolution limit). The peak wavelength was around 405 nm. These results indicate lasing action at room temperature.
机译:我们已经使用大气压金属有机化学气相沉积(MOCVD)在GaN层上成功生长了InGaN自组装量子点(QD)。 QD的平均直径小至8.4nm,并且在室温下观察到来自QD的强发射。接下来,我们研究了堆叠InGaN QD以增加总QD密度的结构。即使堆叠的层数为十,也形成了InGaN QD。随着层数的增加,光致发光(PL)强度急剧增加。此外,我们已经制造出了将InGaN QD嵌入到有源层中的激光器结构。观察到在室温下在光激发下发射强度与激发能量的相关性,清晰的阈值为6.0 mJ / cm / sup 2 /。高于阈值时,发射在横向电(TE)模式下强烈极化,并且发射光谱的线宽减小到0.1 nm以下(分辨率极限)。峰值波长在405nm左右。这些结果表明在室温下有激射作用。

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