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首页> 外文期刊>IEEE journal of selected topics in quantum electronics >Cut-Through Metal Slit Array as an Anisotropic Metamaterial Film
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Cut-Through Metal Slit Array as an Anisotropic Metamaterial Film

机译:贯穿金属狭缝阵列作为各向异性超材料薄膜

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摘要

It has been shown that a metal film with a one-dimensional array of subwavelength cut-through slits can be accurately modeled as an anisotropic and uniform metamaterial film with nondispersive electric permittivity [epsimacr] and magnetic permeability [mumacr] tensors. This model has an interesting scaling property: The values for the thickness Lmacr can be chosen at arbitrarily, provided that [epsimacr] and [mumacr] are scaled accordingly. The analytical expressions of the corrections due to near fields have also been given. This framework provides an intuitive and precise model for the understanding of the metal slit arrays in the subwavelength regime
机译:已经显示,具有一维亚波长穿透狭缝的一维阵列的金属膜可以被精确地建模为具有非分散的介电常数[ε]和磁导率[mumacr]张量的各向异性且均匀的超材料膜。该模型具有有趣的缩放属性:厚度Lmacr的值可以任意选择,只要相应地缩放[epsimacr]和[mumacr]。还给出了由于近场引起的校正的解析表达式。该框架为了解亚波长范围中的金属狭缝阵列提供了直观而精确的模型

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