Fabrication of short GaAs wet-etched mirror lasers and their complex spectral behavior

摘要

A versatile fabrication technique for GaAs-AlGaAs wet-etched mirror lasers is presented. This technique works independently of the Al concentration in the cladding layers up to a value of 70%, and it requires four photolithography steps. Ridge waveguide lasers have been successfully processed using a double heterostructure (DHS) as well as graded index separate confinement heterostructures (GRINSCH) having different quantum-well (QW) active layers. This technique is used to fabricate short-cavity lasers in GRINSCH structures having GaAs multiple-quantum-well (MQW) or bulk active layers. Laser operation was obtained in a 29-/spl mu/m-long device using a 5-QW structure. Short lasers with QW active layers show a complex spectral behavior. These lasers operate at higher current densities (/spl sim/20 kA/cm/sup 2/) and emit light at more than one wavelength. This implies that higher order transitions are involved which is not the case when using a bulk GaAs active layer. Besides the two peaks corresponding to the n=1 and n=2 transitions, we found an intermediate peak which corresponds presumably to the forbidden transition E1-HH2.