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首页> 外文期刊>IEE Proceedings. Part J >Modification of internal temperature distribution in broad area semiconductor lasers and the effect on near- and far-field distributions
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Modification of internal temperature distribution in broad area semiconductor lasers and the effect on near- and far-field distributions

机译:宽域半导体激光器内部温度分布的修改及其对近场和远场分布的影响

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摘要

The results from two novel experimental techniques to investigate the influence of thermal effects on large aperture, high power semiconductor lasers are presented. The first technique is achieved via fabricated micro-stripe heating elements, integrated onto the laser diode using standard photolithographic technology. The second involves focusing an Ar~+ beam onto the injection stripe of a standard broad-area laser to investigate the effect of localised heating. Results from both experiments show that the internal temperature distribution has a pronounced influence on the near- and far-fields of large aperture semiconductor lasers. By tailoring this distribution, significant improvements to near- and far-fields can be obtained.
机译:提出了两种新的实验技术的结果,这些技术研究了热效应对大孔径高功率半导体激光器的影响。第一种技术是通过使用标准光刻技术将微带加热元件集成到激光二极管上而制成的。第二步涉及将Ar〜+光束聚焦到标准广域激光器的注入条纹上,以研究局部加热的影响。这两个实验的结果表明,内部温度分布对大孔径半导体激光器的近场和远场具有显着影响。通过调整此分布,可以对近场和远场进行重大改进。

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