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DC model for BiMOS structure and its adaptation to a circuitsimulation environment

机译:BiMOS结构的DC模型及其对电路仿真环境的适应

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The objective was to develop a model that can accurately describenthe hybrid-mode operation of deep submicron LDD pMOSFETs in a circuitnsimulation environment. The device threshold voltage, various currentncomponents, transconductance, and output conductance are extractednexperimentally, modelled analytically, and adapted to meet the circuitnsimulation requirements. The latter necessitates that the modelnequations, together with their derivatives, be continuous. The effectsnof independently biasing the source, drain, gate, and body potentials onnthe device currents and parameters are highlighted. A criticalncomparison between the presented model XSIM and HSPICE is made. Thenresults show that unlike HSPICE, where the MOSFET and the bipolar devicenembedded in the structure have to be simulated as two entities, thensuggested model describes the composite structure as a single entity andnpredicts its behaviour accurately for a range of different channelnlengths based on a single set of process and device model parameters
机译:目的是开发一种可以在电路仿真环境中准确描述深亚微米LDD pMOSFET的混合模式操作的模型。通过实验提取器件的阈值电压,各种电流分量,跨导和输出电导,进行分析建模,并使其适应电路仿真要求。后者需要模型方程及其派生词是连续的。着重指出了独立偏置源极,漏极,栅极和体电位对器件电流和参数的影响。在提出的模型XSIM和HSPICE之间进行了关键比较。结果表明,与HSPICE不同,在HSPICE中,必须将结构中嵌入的MOSFET和双极器件模拟为两个实体,然后建议的模型将复合结构描述为单个实体,并基于一组单独的N来针对一系列不同的沟道长度准确预测其行为。工艺和设备模型参数

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