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Implantation of 30 keV Helium into Graphene-Coated Tungsten

机译:将30 keV氦注入石墨烯包覆的钨中

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摘要

This technical note describes the use of graphene as a way to protect plasma facing components from erosion, sputtering and diminished plasma performance and to extend component lifetimes in experimental plasma devices. In this work, 30 keV ionized helium is used as a projectile on graphene covered tungsten over a range of fluences. Graphene's vacancy yield (ID) and natural resonance (IG) are found at similar to 1350 cm(-1) and similar to 1550 cm(-1), respectively. Damage of each sample is quantified using the ID/IG ratio via Raman spectroscopy (RS) at the aforementioned wave numbers. The surface morphology is studied using Scanning Electron Microscopy (SEM) and the mass losses are recorded using a high-precision scale. The results from this study are of considerable importance since they indicate that a graphene coating could be an effective candidate for reducing erosion in different PFC materials.
机译:本技术说明描述了使用石墨烯作为保护面对等离子体的组件免受腐蚀,溅射和等离子体性能下降以及延长实验等离子体设备中组件寿命的一种方法。在这项工作中,使用30 keV的离子化氦气作为射弹,在一定的注量范围内覆盖石墨烯覆盖的钨。发现石墨烯的空位产率(ID)和自然共振(IG)分别类似于1350 cm(-1)和1550 cm(-1)。使用ID / IG比通过拉曼光谱法(RS)在上述波数下量化每个样品的损伤。使用扫描电子显微镜(SEM)研究表面形态,并使用高精度标度记录质量损失。这项研究的结果具有重要意义,因为它们表明石墨烯涂层可能是减少不同PFC材料中腐蚀的有效候选者。

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