机译:真空等离子喷涂钨暴露于PISCES和DIII-D等离子
Institute of Plasma Physics, Chinese Academy of Sciences, Hefei, Anhui 230031, China;
Institute of Plasma Physics, Chinese Academy of Sciences, Hefei, Anhui 230031, China;
Center for Energy Research, University of California, San Diego, La-Jolla, CA 92093-0417. USA;
Genera! Atomics, P.O. Box 85608, San Diego, CA 92186-5608, USA;
Center for Energy Research, University of California, San Diego, La-Jolla, CA 92093-0417. USA;
Radiation Solid Interactions Department, Sandia National Laboratory, Albuquerque, NM 87185, USA;
Institute of Plasma Physics, Chinese Academy of Sciences, Hefei, Anhui 230031, China;
plasma facing materials; vps-w; surface morphology; erosion; retention;
机译:使用DC真空等离子喷涂和RF低压等离子喷涂方法在铁素体-马氏体钢上镀厚钨层而无中间层
机译:暴露于低能量,高通量纯氦种子的D等离子体中的多孔真空等离子喷涂钨涂层中的氘保留
机译:等离子喷涂材料真空等离子喷涂钨砖的热疲劳试验
机译:真空等离子喷涂钨涂层与铜合金之间的等离子层应用中的顺应层的优化
机译:等离子喷涂纳米级碳化钨-钴(WC-Co)的磨料磨损。
机译:真空等离子喷涂HfCTiC和HfC / TiC超高温陶瓷涂层的组织和力学性能
机译:真空等离子喷涂纳米结构碳化钨-碳化f块状复合材料的结构与性能评价