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Recent research situation in tin dioxide nanomaterials: synthesis, microstructures, and properties

机译:二氧化锡纳米材料的最新研究现状:合成,微观结构和性能

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摘要

This review article summarizes the new research in solid-state physical chemistry understanding of the microstructure characteristics of semiconductor tin oxide thin films made in the last years in our group. The work mainly focuses on the fabrication technology of semiconductor tin oxides thin films by using pulsed laser deposition (PLD) as well as the application of this technology on new micro- and nanostructured materials. It is an interdisciplinary work that integrates the areas of physics, chemistry and materials science.
机译:这篇综述文章总结了在固态物理化学中对我们小组最近几年制造的半导体氧化锡薄膜的微结构特征的新研究。这项工作主要集中在使用脉冲激光沉积(PLD)的半导体氧化锡薄膜的制造技术上,以及该技术在新型微结构和纳米结构材料上的应用。这是一个跨学科的工作,整合了物理,化学和材料科学领域。

著录项

  • 来源
    《Frontiers of materials science》 |2013年第3期|203-226|共24页
  • 作者单位

    Shanghai Applied Radiation Institute, School of Environmental and Chemical Engineering, Shanghai University. Shanghai 200444, China,Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon Tong, Hong Kong, China;

    Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon Tong, Hong Kong, China;

    Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon Tong, Hong Kong, China;

    Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon Tong, Hong Kong, China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    tin dioxide; thin film; synthesis; microstructure; nanostructure; property;

    机译:二氧化锡薄膜;合成;微观结构纳米结构属性;

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