Adaptive sampling technology - the next step for factory efficiency

摘要

As the semiconductor industry moves to ever smaller geometries in its manufacturing processes, a change in the criticality of metrology data is also occurring. Through most of the history of IC manufacturing, devices could be manufactured in processes that used metrology data for monitoring and excursion control purposes. The processes ran effectively in an open-loop mode with corrections being made manually based on offline review of the collected data. In such scenarios, metrology is not a mission-critical portion of the manufacturing process.