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Dependence of processing gain and interference immunity of adaptive narrow-band beam-formers on angular locations of interference sources

机译:自适应窄带波束形成器的处理增益和抗干扰性取决于干扰源的角位置

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摘要

The dependence of processing gain and interference immunity of adaptive narrowband linear beamformers on angular locations of single, double, and L interference sources is investigated. Corresponding expressions of these figures of merit are derived. It is found that different angular locations may correspond to the same processing gain and interference immunity. The former varies from unity to a maximum value which under certain conditions is independent of both the array geometry and the number of interference sources. The null directions of the quiescent beam correspond to unity processing gain and 100% interference immunity. However, there are always other directions where the processing gain is unity but the interference immunity is extremely small. The maximum processing gain is always associated with 50% immunity.
机译:研究了自适应窄带线性波束形成器的处理增益和抗干扰性对单,双和L干扰源的角位置的依赖性。得出这些品质因数的相应表达。发现不同的角度位置可以对应于相同的处理增益和抗干扰性。前者从单位变化到最大值,在某些条件下,最大值与阵列的几何形状和干扰源的数量无关。静态光束的零方向对应于单位处理增益和100%抗干扰性。但是,总有其他方向的处理增益是统一的,而抗干扰性却很小。最大的处理增益始终与50%的抗扰度有关。

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