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首页> 外文期刊>Emerging and Selected Topics in Circuits and Systems, IEEE Journal on >Design Challenges in 3-D SoC Stacked With a 12.8 GB/s TSV Wide I/O DRAM
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Design Challenges in 3-D SoC Stacked With a 12.8 GB/s TSV Wide I/O DRAM

机译:集成了12.8 GB / s TSV宽I / O DRAM的3-D SoC中的设计挑战

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Design techniques for 3-D SoC stacked with a Wide I/O DRAM with through silicon via (TSV) technology were developed. Some of the developed techniques were applied to design a Wide I/O DRAM controller chip. Micro-I/O cells and area efficient decoupling capacitor cells are implemented in between the fine pitch TSV array. Test circuitry for pre-bonding TSV tests are embedded in the micro-I/O cells with small area overhead. In order to reduce Vmin degradation induced by 512 DQs simultaneous switching noise, we introduce a package-board impedance optimization scheme utilizing a full digital noise monitor. We also developed a thermal aware memory control technique to adaptively change the refresh rates per channel, which are hot due to SoC hotspots. We achieved 12.8 GB/s operation, while I/O power was reduced by 89% compared to LPDDR3.
机译:开发了用于具有通过硅通孔(TSV)技术的宽I / O DRAM堆叠的3-D SoC的设计技术。一些已开发的技术被用于设计Wide I / O DRAM控制器芯片。在细间距TSV阵列之间实现了微型I / O单元和面积有效的去耦电容器单元。用于预绑定TSV测试的测试电路以较小的面积开销嵌入到微型I / O单元中。为了减少由512 DQs同时开关噪声引起的Vmin降低,我们引入了利用全数字噪声监测器的封装板阻抗优化方案。我们还开发了一种热敏存储器控制技术,以自适应地更改每个通道的刷新率,这些刷新率由于SoC热点而很热。与LPDDR3相比,我们达到了12.8 GB / s的运行速度,而I / O功耗降低了89%。

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