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首页> 外文期刊>Electronics Letters >Yellow light (576 nm) lasing emission of GaInP/AlInP multiple quantum well lasers prepared by gas-source-molecular-beam-epitaxy
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Yellow light (576 nm) lasing emission of GaInP/AlInP multiple quantum well lasers prepared by gas-source-molecular-beam-epitaxy

机译:气源分子束外延制备的GaInP / AlInP多量子阱激光器的黄光(576 nm)激光发射

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摘要

GaInP/AlInP MQW short-wavelength lasers with AlInP cladding layers were fabricated using a gas source molecular beam epitaxy (GSMBE) for the first time. The film thickness of the GaInP wells and AlInP barriers were 3 and 2 nm, respectively. A yellow light lasing emission (576 nm) at 109 K was demonstrated by the MQW structure.
机译:首次使用气体源分子束外延(GSMBE)制造了具有AlInP包层的GaInP / AlInP MQW短波长激光器。 GaInP阱和AlInP势垒的膜厚度分别为3nm和2nm。 MQW结构证明了109 K处的黄激光发射(576 nm)。

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