90nm still has vias to cross

摘要

Most in the industry believe that 193m lithography with optical proximity correction and phaseshifting will be the technology of choice for the critical layers at the 193nm node. But just as the industry is making 248nm work for the 0.13-micron node, [Buno Pati] said there are customers discussing the possibility of using their installed base of 248nm machines to do the critical layers for the 90nm node.