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Characterization of layout dependent thermal coupling in SOI CMOS current mirrors

机译:SOI CMOS电流镜中与布局有关的热耦合特性

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摘要

A current mirror is proposed as a suitable structure for the characterization of layout dependent thermal coupling between MOSFETs. Using current and voltage measurements, and compensating for series resistance effects, very small changes in local device temperature can be made visible. For the first time it is demonstrated that thermal coupling can be observed in a 2 /spl mu/m SOI CMOS technology, with devices separated by as much as 20 /spl mu/m. Measurements were verified by electro-thermal SPICE simulations, using a simple lumped model to express thermal coupling. The observations reinforce the need for accurate circuit level models, including self heating and thermal coupling effects, for analogue applications in VLSI SOI CMOS technologies.
机译:提出了一种电流镜,作为表征MOSFET之间布局相关的热耦合特性的合适结构。使用电流和电压测量并补偿串联电阻效应,可以使本地设备温度发生很小的变化。首次证明了在2 / spl mu / m SOI CMOS技术中可以观察到热耦合,器件之间的间距高达20 / spl mu / m。使用简单的集总模型来表示热耦合,通过电热SPICE模拟验证了测量结果。这些观察结果增强了对用于VLSI SOI CMOS技术中的模拟应用的精确电路级模型的需求,包括自加热和热耦合效应。

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