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Disturb-Free Writing Operation for Ferroelectric-Gate Field-Effect Transistor Memories With Intermediate Electrodes

机译:带中间电极的铁电门场效应晶体管存储器的无干扰写入操作

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摘要

To achieve disturb-free writing, we proposed a new writing operation for ferroelectric-gate field-effect transistor memories with intermediate electrodes. The writing voltages $V_{W}$ applied to the wordlines for $Pr^{+}$ and $Pr^{0}$ memory states are the same pulse magnitudes, which consist of $V_{W}^{+}$ followed by $V_{W}^{-}$, whereas the bias timings of the bitline voltages differ from each other. The bitline voltage for the $Pr^{+}$ memory state is set high when $V_{W}$ is set $V_{W}^{+}$ , and it is set to low by the time when $V_{W}$ is changed to $V_{W}^{-}$. On the other hand, the bitline voltage for the $Pr^{0}$ memory state is set high until the whole writing pulse of $(V_{W}^{+} + V_{W}^{-})$ is finished. This is verified experimentally using a discrete circuit, which showed that the new writing operation achieves disturb-free writing. The memory consists of two transistors for data writing and reading. With the obtained experimental results, we discuss the possibilities of high integration of this memory as well as low reading voltage.
机译:为了实现无干扰写入,我们提出了一种对带有中间电极的铁电栅场效应晶体管存储器的新写入方法。施加到$ Pr ^ {+} $和$ Pr ^ {0} $存储状态的字线上的写入电压$ V_ {W} $具有相同的脉冲幅度,包括$ V_ {W} ^ {+} $其次是$ V_ {W} ^ {-} $,而位线电压的偏置时序彼此不同。 $ V_ {W} $设置为$ V_ {W} ^ {+} $时,$ Pr ^ {+} $存储状态的位线电压设置为高,而当$ V_ {时,该位线电压设置为低。 W} $更改为$ V_ {W} ^ {-} $。另一方面,$ Pr ^ {0} $存储状态的位线电压设置为高,直到$(V_ {W} ^ {+} + V_ {W} ^ {-})$的整个写入脉冲为完成。使用分立电路进行了实验验证,结果表明,新的写入操作可实现无干扰写入。存储器由两个用于数据写入和读取的晶体管组成。利用获得的实验结果,我们讨论了该存储器的高集成度以及低读取电压的可能性。

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