首页> 外文期刊>Electron Devices, IEEE Transactions on >Orientation and Shape Effects on Ballistic Transport Properties in Gate-All-Around Rectangular Germanium Nanowire nFETs
【24h】

Orientation and Shape Effects on Ballistic Transport Properties in Gate-All-Around Rectangular Germanium Nanowire nFETs

机译:取向和形状对全方位栅矩形锗纳米线nFET中弹道传输特性的影响

获取原文
获取原文并翻译 | 示例
           

摘要

The electron transport properties of square and rectangular cross-sectional germanium nanowire (GeNW) field-effect transistors (FETs) with [001], [110], [111], and [112] crystal orientations are investigated. The electronic states of GeNWs are calculated by using an $sp^{3}d^{5}s^{ast}$ tight-binding model coupled to a Poisson equation self-consistently. A semiclassical ballistic FET model is used to evaluate the electron transport characteristics. For the square cross section, electron injection velocity dominates the drive current in GeNW FETs because the inversion electron density in the GeNW channels is mainly determined by the capacitance of the gate insulator, and a [110] GeNW FET achieves the highest drive current of all the orientations. In the case of rectangular cross section, the electron density in GeNWs is dependent on their orientations and cross-sectional geometries due to the small quantum capacitance, and the difference of the density of states of GeNWs significantly affects the drive current. A [112] GeNW FET on a $(hbox{1}bar{hbox{1}}hbox{0})$ face exhibits the highest injection velocity of all the calculated FETs but low drive current because of its insufficient density of states. As a result, a [110] GeNW FET on a (001) face, which has both large density of states and high injection velocity, achieves the highest drive current.
机译:研究了具有[001],[110],[111]和[112]晶体取向的方形和矩形截面锗纳米线(GeNW)场效应晶体管(FET)的电子传输特性。 GeNWs的电子状态是通过使用自洽地耦合到Poisson方程的$ sp ^ {3} d ^ {5} s ^ {ast} $紧密绑定模型来计算的。半经典的弹道FET模型用于评估电子传输特性。对于正方形横截面,GeNW FET中的电子注入速度主导着驱动电流,因为GeNW沟道中的反型电子密度主要由栅极绝缘体的电容决定,并且[110] GeNW FET实现了所有驱动器中最高的驱动电流。方向。在矩形截面的情况下,由于量子电容小,GeNWs中的电子密度取决于其取向和截面几何形状,并且GeNWs的状态密度差异显着影响驱动电流。 $(hbox {1} bar {hbox {1}} hbox {0})$面上的[112] GeNW FET在所有计算出的FET中表现出最高的注入速度,但由于其状态密度不足而具有较低的驱动电流。结果,(001)面上的[110] GeNW FET同时具有大的状态密度和高的注入速度,可实现最高的驱动电流。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号