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机译:用于RESURF LDMOS晶体管的基于物理的分析
Department of Electrical Engineering and the Nanotechnology Research and Teaching Facility, University of Texas, Arlington, USA;
Degradation; Logic gates; Noise; Noise measurement; Silicon; Stress; Voltage measurement; formula formulatype="inline"tex Notation="TeX"$hbox{1}/f$/tex /formula noise; Extended drain; lateral double-diffused MOS (LDMOS); n-well resistor; reduced-surface-field (RESURF); unified formula formulatype="inline" tex Notation="TeX"$hbox{1}/f$/tex/formula noise model;
机译:门对
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