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Impact of Isolation-Feature Geometry on Self-Heating of AlGaN/GaN HFETs

机译:隔离特征几何形状对AlGaN / GaN HFET自热的影响

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Correlation between the isolation-feature geometry and average channel temperature of AlGaN/GaN heterojunction field-effect transistors (HFETs) is investigated. The reported transistors of this paper were realized on a variety of isolation-feature geometries resembling the following structures: 1) island; 2) fin; 3) comb; and 4) ladder. The average channel temperature of the devices from all categories of the fabricated AlGaN/GaN HFETs was studied using finite element analysis in ANSYS Mechanical. To check the validity of these analyses, results were compared with the experimental data. According to these studies, a less pronounced self-heating is observed in devices, which enjoyed a closer proximity between the drain-edge of the gate and side-walls of the isolation feature. Among these devices, for the same moderate dc bias power of 5 W/mm (i.e., per millimeter width of the transistor), (sim 60) K decrease in the average channel temperature is observed.
机译:研究了AlGaN / GaN异质结场效应晶体管(HFET)的隔离特征几何形状与平均沟道温度之间的关系。本文报道的晶体管是在具有以下结构的各种隔离特征几何结构上实现的:1)岛; 2)鳍; 3)梳子;和4)梯子。使用ANSYS Mechanical中的有限元分析研究了所有类别的AlGaN / GaN HFET器件中器件的平均沟道温度。为了检查这些分析的有效性,将结果与实验数据进行了比较。根据这些研究,在器件中观察到不太明显的自发热,该器件在栅极的漏极边缘和隔离部件的侧壁之间的距离更近。在这些设备中,对于5 W / mm(即,晶体管的每毫米宽度)相同的中等dc偏置功率, (sim 60) 观察到平均通道温度K降低。

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