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Quantum Analytical Modeling for Device Parameters and (I) (V) Characteristics of Nanoscale Dual-Material Double-Gate Silicon-on-Nothing MOSFET

机译:设备参数和 (I) (V) 纳米级双材料双栅极无硅MOSFET的特性

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摘要

This paper presents the quantum analytical model, based on the self-consistent solution of 1-D Schrödinger equation and 2-D Poisson’s equation for the ultrascaled dual-material double-gate (DMDG) silicon-on-nothing MOSFET structure. The quantum mechanical effects (QMEs) have been incorporated in our model to derive the analytical current expressions for the first time ever. Extensive calculations have been carried out to analyze the QMEs on such device performance parameters, like electric field, transconductance, drain conductance, and voltage gain. A comparative analysis based on the drain current has been presented in this paper for the classical and for the quantum model. The authenticity of our proposed quantum model for the DMDG structure is verified by the agreement among the results obtained from the analytical model as well as simulations.
机译:本文基于一维薛定ding方程和二维泊松方程的自洽解,针对超尺度双材料双栅极无硅MOSFET结构,提出了量子分析模型。量子力学效应(QME)已被引入我们的模型中,这是有史以来第一次得出解析电流表达式。已经进行了广泛的计算以分析此类器件性能参数(如电场,跨导,漏极电导和电压增益)上的QME。本文针对经典模型和量子模型进行了基于漏极电流的比较分析。通过从分析模型和模拟获得的结果之间的一致性,验证了我们提出的DMDG结构量子模型的真实性。

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