首页> 外文期刊>IEEE Transactions on Electron Devices >Capacitance/Conductance–Voltage–Frequency Characteristics of ${rm Au}/{rm PVC}+{rm TCNQ}/{rm p}hbox{-}{rm Si}$ Structures in Wide Frequency Range
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Capacitance/Conductance–Voltage–Frequency Characteristics of ${rm Au}/{rm PVC}+{rm TCNQ}/{rm p}hbox{-}{rm Si}$ Structures in Wide Frequency Range

机译:宽频率范围内$ {rm Au} / {rm PVC} + {rm TCNQ} / {rm p} hbox {-} {rm Si} $结构的电容/电导-电压-频率特性

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The energy dependence of the interface states $(N_{{rm ss}})$ and relaxation time $(tau)$ and capture cross section $(sigma_{{rm p}})$ of $N_{{rm ss}}$ in $({rm Au}/{rm PVC}+{rm TCNQ}/{rm p}hbox{-}{rm Si})$ heterojunction were investigated using high–low frequency capacitance $(C_{{rm HF}}-C_{{rm LF}})$ and conductance method, which contains many capacitance/conductance $[C/(G/omega)-V]$ plots. The $C$ value of the heterojunction increases with decreasing frequency as almost exponentially due to the existence of $N_{{rm ss}}$ between metal and semiconductor. The $N_{{rm ss}}$ and $tau$ values have been obtained in the (0.053-$E_{{rm v}}$)-(0.785- $E_{{rm v}}$)-eV energy range by considering the voltage-dependent surface potential obtained from the lowest measurable frequency $C{-}V$ curve at 1 kHz. The magnitude of $N_{{rm ss}}$ ranges from $3.88times 10^{12}~{rm eV}^{-1}{rm cm}^{-2}$ to $3.24times 10^{{12}}~{rm eV}^{-1}{rm cm}^{-2}$. In the same energy range, the value of $tau$ ranges from $5.73times 10^{-5}$ to $1.58times 10^{-4}~{rm s}$ and shows almost an exponential increase with increasing bias from the top of the valance band edge toward the midgap of semiconductor. The obtained $N_{{rm ss}}$ values from $C_{{rm HF}}{-}C_{{rm LF}}$ and conductance methods are in good agreement with each other for the heterojunction. As a result, the mean value of $N_{{rm ss}}$ was found on the order of $10^{12}~{rm eV}^{-1}{rm cm}^{-2}$ and this value is very suitable for an electronic device.
机译:界面的能量依赖性表示$(N _ {{rm ss}})$和弛豫时间$(tau)$以及捕获$ N _ {{rm ss}}的横截面$(sigma _ {{rm p}})$使用高频电容$(C _ {{rm HF}研究了$({rm Au} / {rm PVC} + {rm TCNQ} / {rm p} hbox {-} {rm Si})$异质结中的$ } -C _ {{rm LF}})和电导方法,其中包含许多电容/电导$ [C /(G / omega)-V] $图。由于金属和半导体之间存在$ N _ {{rm ss}} $,异质结的$ C $值随着频率的降低而呈指数增长。已在(0.053- $ E _ {{rm v}} $)-(0.785- $ E _ {{rm v}} $)-eV能量中获得$ N _ {{rm ss}} $和$ tau $值通过考虑从最低可测量频率$ C {-} V $曲线在1 kHz处获得的电压相关表面电势来确定该范围。 $ N _ {{rm ss}} $的大小范围从$ 3.88乘以10 ^ {12}〜{rm eV} ^ {-1} {rm cm} ^ {-2} $到$ 3.24乘以10 ^ {{12} }〜{rm eV} ^ {-1} {rm cm} ^ {-2} $。在相同的能量范围内,tau $的值范围从$ 5.73乘以10 ^ {-5} $到$ 1.58乘以10 ^ {-4}〜{rm s} $,并且随着顶部偏差的增加而几乎呈指数增长。价带边缘朝着半导体中间间隙的方向移动。从$ C _ {{rm HF}} {-} C _ {{rm LF}} $获得的$ N _ {{rm ss}} $值与电导方法在异质结方面彼此非常吻合。结果,发现$ N _ {{rm ss}} $的平均值约为$ 10 ^ {12}〜{rm eV} ^ {-1} {rm cm} ^ {-2} $。价值非常适合电子设备。

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