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首页> 外文期刊>Electron Devices, IEEE Transactions on >Localization of Joule Heating in Phase-Change Memory With Incorporated Nanostructures and Nanolayer for Reducing Reset Current
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Localization of Joule Heating in Phase-Change Memory With Incorporated Nanostructures and Nanolayer for Reducing Reset Current

机译:结合了纳米结构和纳米层的相变存储器中焦耳加热的局部化,以减少复位电流

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摘要

In this paper, we intensively investigated the proposed nanocontact phase-change memory (nano-C PCM) with incorporated nanostructures and high-resistivity nanolayer (nano-L) for reducing reset current. The high resistivity was able to be tuned by doping N into the conventional GeSbTe phase-change material. The analysis based on finite-element method exhibited that the current density in the nano-C PCM could be locally enhanced to about two times that of both conventional and nano-L PCM devices. This resulted in the localization of Joule heating in the nano-C PCM, making it have the highest temperature at the same programming current among the three types of PCM devices. Reset current of nano-C PCM could be greatly reduced to 8.2% of that of the conventional one, owing to its high-efficiency heating for amorphization.
机译:在本文中,我们深入研究了所提出的具有纳米结构和高电阻纳米层(nano-L)的纳米接触相变存储器(nano-C PCM),以减少复位电流。通过将N掺杂到传统的GeSbTe相变材料中,可以调节高电阻率。基于有限元方法的分析表明,纳米C PCM中的电流密度可以局部提高到传统和纳米L PCM器件的两倍。这导致在纳米C PCM中进行焦耳加热的局部化,使其在三种编程类型的PCM器件中以相同的编程电流具有最高的温度。纳米C PCM的复位电流可以有效地降低到传统的8.2%,这归因于其高效的非晶化加热能力。

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